Improvement in photomask critical dimension uniformity using etch selectivity control - ScienceDirect
Global CD uniformity measurement based on 15 points on a reticle. 5 The... | Download Scientific Diagram
Process Setup and Optimization • LithExx-Systems
Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modeling, and Experiment | Semantic Scholar
Effect of Wetting Time on CD Uniformity in Immersion Lithography
CD uniformity at pitch 80nm after a/litho and b/etch for negative tone... | Download Scientific Diagram
Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modeling, and Experiment | Semantic Scholar
Sub-20 nm multilayer nanopillar patterning for hybrid SET/CMOS integration - ScienceDirect
CD uniformity maps obtained using the optical technique described... | Download Scientific Diagram
Global AEI CD uniformity comparison between n&k R-T Scatterometer and... | Download Scientific Diagram
Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modelin
Controlling Uniformity At The Edge
Extending ArFi to 22 nm and Beyond with Advanced CDU Control
Extreme ultraviolet lithography reticle local CD uniformity correlation to wafer local CD uniformity
Photomask
n&k CD (nm) Uniformity Map Figure 20. n&k Depth (nm) Uniformity Map | Download Scientific Diagram
슬라이드 1
A study of AA CD uniformity loading optimization at 28nm node | Semantic Scholar
Critical Dimension Control and its Implications in IC Performance - ppt download
Intel and Nikon Litho Specialists Discuss Overlay Matching and Edge Placement Error for Production Beyond 20 nm
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Enhanced Spatial PEB Uniformity through a Novel Bake Plate Design | Semantic Scholar
CD Uniformity comparison of random contact windows with ArF and KrF... | Download Scientific Diagram
Requirement for mask CD uniformity and mask induced overlay error. | Download Scientific Diagram
